Zhao, M.-J.; Zhang, Z.-X.; Hsu, C.-H.; Zhang, X.-Y.; Wu, W.-Y.; Lien, S.-Y.; Zhu, W.-Z.
Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy. Nanomaterials 2021, 11, 978.
https://doi.org/10.3390/nano11040978
AMA Style
Zhao M-J, Zhang Z-X, Hsu C-H, Zhang X-Y, Wu W-Y, Lien S-Y, Zhu W-Z.
Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy. Nanomaterials. 2021; 11(4):978.
https://doi.org/10.3390/nano11040978
Chicago/Turabian Style
Zhao, Ming-Jie, Zhi-Xuan Zhang, Chia-Hsun Hsu, Xiao-Ying Zhang, Wan-Yu Wu, Shui-Yang Lien, and Wen-Zhang Zhu.
2021. "Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy" Nanomaterials 11, no. 4: 978.
https://doi.org/10.3390/nano11040978
APA Style
Zhao, M.-J., Zhang, Z.-X., Hsu, C.-H., Zhang, X.-Y., Wu, W.-Y., Lien, S.-Y., & Zhu, W.-Z.
(2021). Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy. Nanomaterials, 11(4), 978.
https://doi.org/10.3390/nano11040978