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Journal: Nanomaterials, 2021
Volume: 11
Number: 3363

Article: Stability of SiNx Prepared by Plasma-Enhanced Chemical Vapor Deposition at Low Temperature
Authors: by Chi Zhang, Majiaqi Wu, Pengchang Wang, Maoliang Jian, Jianhua Zhang and Lianqiao Yang
Link: https://www.mdpi.com/2079-4991/11/12/3363

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