Wen, H.; Luna-Romera, J.M.; Riquelme, J.C.; Dwyer, C.; Chang, S.L.Y.
Statistically Representative Metrology of Nanoparticles via Unsupervised Machine Learning of TEM Images. Nanomaterials 2021, 11, 2706.
https://doi.org/10.3390/nano11102706
AMA Style
Wen H, Luna-Romera JM, Riquelme JC, Dwyer C, Chang SLY.
Statistically Representative Metrology of Nanoparticles via Unsupervised Machine Learning of TEM Images. Nanomaterials. 2021; 11(10):2706.
https://doi.org/10.3390/nano11102706
Chicago/Turabian Style
Wen, Haotian, José MarÃa Luna-Romera, José C. Riquelme, Christian Dwyer, and Shery L. Y. Chang.
2021. "Statistically Representative Metrology of Nanoparticles via Unsupervised Machine Learning of TEM Images" Nanomaterials 11, no. 10: 2706.
https://doi.org/10.3390/nano11102706
APA Style
Wen, H., Luna-Romera, J. M., Riquelme, J. C., Dwyer, C., & Chang, S. L. Y.
(2021). Statistically Representative Metrology of Nanoparticles via Unsupervised Machine Learning of TEM Images. Nanomaterials, 11(10), 2706.
https://doi.org/10.3390/nano11102706