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Journal: Nanomaterials, 2021
Volume: 11
Number: 33

Article: Highly Aligned Polymeric Nanowire Etch-Mask Lithography Enabling the Integration of Graphene Nanoribbon Transistors
Authors: by Sangheon Jeon, Pyunghwa Han, Jeonghwa Jeong, Wan Sik Hwang and Suck Won Hong
Link: https://www.mdpi.com/2079-4991/11/1/33

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