Next Article in Journal
Magnetocrystalline and Surface Anisotropy in CoFe2O4 Nanoparticles
Previous Article in Journal
Nanoparticle Recognition on Scanning Probe Microscopy Images Using Computer Vision and Deep Learning
Previous Article in Special Issue
Molecular Dynamics Simulation of Polyacrylamide Adsorption on Cellulose Nanocrystals

This is an early access version, the complete PDF, HTML, and XML versions will be available soon.

Open AccessArticle

Correlation between Crystal Structure, Surface/Interface Microstructure, and Electrical Properties of Nanocrystalline Niobium Thin Films

1
Center for Advanced Materials Research, University of Texas at El Paso, 500 W. Univ. Ave., El Paso, TX 79968, USA
2
Department of Physics, University of California, Santa Barbara, Broida Hall, Santa Barbara, CA 93106, USA
3
Department of Mechanical Engineering, University of Texas at El Paso, 500 W. Univ. Ave., El Paso, TX 79968, USA
*
Author to whom correspondence should be addressed.
Nanomaterials 2020, 10(7), 1287; https://doi.org/10.3390/nano10071287
Received: 10 May 2020 / Revised: 14 June 2020 / Accepted: 26 June 2020 / Published: 30 June 2020
(This article belongs to the Special Issue Characterization of Nanocrystalline Materials)
Niobium (Nb) thin films, which are potentially useful for integration into electronics and optoelectronics, were made by radio-frequency magnetron sputtering by varying the substrate temperature. The deposition temperature (Ts) effect was systematically studied using a wide range, 25–700 °C, using Si(100) substrates for Nb deposition. The direct correlation between deposition temperature (Ts) and electrical properties, surface/interface microstructure, crystal structure, and morphology of Nb films is reported. The Nb films deposited at higher temperature exhibit a higher degree of crystallinity and electrical conductivity. The Nb films’ crystallite size varied from 5 to 9 (±1) nm and tensile strain occurs in Nb films as Ts increases. The surface/interface morphology of the deposited Nb films indicate the grain growth and dense, vertical columnar structure at elevated Ts. The surface roughness derived from measurements taken using atomic force microscopy reveal that all the Nb films are characteristically smooth with an average roughness <2 nm. The lowest electrical resistivity obtained was 48 µΩ cm. The correlations found here between growth conditions electrical properties as well as crystal structure, surface/interface morphology, and microstructure, could provide useful information for optimum conditions to produce Nb thin films for utilization in electronics and optoelectronics.
Keywords: niobium; thin films; nanostructure; microstructure; electrical properties niobium; thin films; nanostructure; microstructure; electrical properties
MDPI and ACS Style

Nivedita, L.R.; Haubert, A.; Battu, A.K.; Ramana, C.V. Correlation between Crystal Structure, Surface/Interface Microstructure, and Electrical Properties of Nanocrystalline Niobium Thin Films. Nanomaterials 2020, 10, 1287.

Show more citation formats Show less citations formats
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Article Access Map by Country/Region

1
Search more from Scilit
 
Search
Back to TopTop