Chen, L.; Ran, Y.; Jiang, Z.; Li, Y.; Wang, Z.
Structural, Compositional, and Plasmonic Characteristics of Ti–Zr Ternary Nitride Thin Films Tuned by the Nitrogen Flow Ratio in Magnetron Sputtering. Nanomaterials 2020, 10, 829.
https://doi.org/10.3390/nano10050829
AMA Style
Chen L, Ran Y, Jiang Z, Li Y, Wang Z.
Structural, Compositional, and Plasmonic Characteristics of Ti–Zr Ternary Nitride Thin Films Tuned by the Nitrogen Flow Ratio in Magnetron Sputtering. Nanomaterials. 2020; 10(5):829.
https://doi.org/10.3390/nano10050829
Chicago/Turabian Style
Chen, Lianlian, Yujing Ran, Zhaotan Jiang, Yinglan Li, and Zhi Wang.
2020. "Structural, Compositional, and Plasmonic Characteristics of Ti–Zr Ternary Nitride Thin Films Tuned by the Nitrogen Flow Ratio in Magnetron Sputtering" Nanomaterials 10, no. 5: 829.
https://doi.org/10.3390/nano10050829
APA Style
Chen, L., Ran, Y., Jiang, Z., Li, Y., & Wang, Z.
(2020). Structural, Compositional, and Plasmonic Characteristics of Ti–Zr Ternary Nitride Thin Films Tuned by the Nitrogen Flow Ratio in Magnetron Sputtering. Nanomaterials, 10(5), 829.
https://doi.org/10.3390/nano10050829