Varasteanu, P.; Romanitan, C.; Bujor, A.; Tutunaru, O.; Craciun, G.; Mihalache, I.; Radoi, A.; Kusko, M.
From Chip Size to Wafer-Scale Nanoporous Gold Reliable Fabrication Using Low Currents Electrochemical Etching. Nanomaterials 2020, 10, 2321.
https://doi.org/10.3390/nano10112321
AMA Style
Varasteanu P, Romanitan C, Bujor A, Tutunaru O, Craciun G, Mihalache I, Radoi A, Kusko M.
From Chip Size to Wafer-Scale Nanoporous Gold Reliable Fabrication Using Low Currents Electrochemical Etching. Nanomaterials. 2020; 10(11):2321.
https://doi.org/10.3390/nano10112321
Chicago/Turabian Style
Varasteanu, Pericle, Cosmin Romanitan, Alexandru Bujor, Oana Tutunaru, Gabriel Craciun, Iuliana Mihalache, Antonio Radoi, and Mihaela Kusko.
2020. "From Chip Size to Wafer-Scale Nanoporous Gold Reliable Fabrication Using Low Currents Electrochemical Etching" Nanomaterials 10, no. 11: 2321.
https://doi.org/10.3390/nano10112321
APA Style
Varasteanu, P., Romanitan, C., Bujor, A., Tutunaru, O., Craciun, G., Mihalache, I., Radoi, A., & Kusko, M.
(2020). From Chip Size to Wafer-Scale Nanoporous Gold Reliable Fabrication Using Low Currents Electrochemical Etching. Nanomaterials, 10(11), 2321.
https://doi.org/10.3390/nano10112321