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Journal: Appl. Sci., 2019
Volume: 9
Number: 785

Article: Improving the Lot Fabrication Stability and Performance of Silica Optical Films during PECVD
Authors: by Yu Zheng, Piaopiao Gao, Zhixin Xiao, Jianying Zhou, Ji’an Duan and Bo Chen
Link: https://www.mdpi.com/2076-3417/9/4/785

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