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NO Removal by Plasma-Enhanced NH3-SCR Using Methane as an Assistant Reduction Agent at Low Temperature

1
Shanghai Key Laboratory of Atmospheric Particle Pollution and Prevention (LAP3), Institute of Environmental Science, Fudan University, Shanghai 200433, China
2
National Engineering Laboratory for VOCs Pollution Control Material & Technology, University of Chinese Academy of Sciences, Beijing 101408, China
3
Bao Wu Group Environmental Resources Technology Co., Ltd, Shanghai 200000, China
4
Shanghai Institute for Design & Research on Environmental Engineering, Shanghai 200232, China
*
Authors to whom correspondence should be addressed.
Appl. Sci. 2019, 9(13), 2751; https://doi.org/10.3390/app9132751
Received: 18 June 2019 / Revised: 1 July 2019 / Accepted: 2 July 2019 / Published: 8 July 2019
(This article belongs to the Special Issue Air Pollution)
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Abstract

The effects of using CH4 as an assistant reduction agent in plasma-assisted NH3–SCR were investigated. The new hybrid reaction system performed better than DBD–NH3–SCR when the O2 concentration varied from 2% to 12%. Compared with DBD–NH3–SCR, DBD–NH3–CH4–SCR (NH3:CH4 = 1:1) showed a more significant promotion effect on the performance and N2 selectivity for NOX abatement. When the O2 concentration was 6% and the SIE was 512 J/L, the NO removal efficiency of the new hybrid system reached 84.5%. The outlet gas components were observed via FTIR to reveal the decomposition process and its mechanism. This work indicated that CH4, as an assistant agent, enhances DBD–NH3–SCR in excess oxygen to achieve a new process with significantly higher activity at a low temperature (≤348 K) for NOX removal. View Full-Text
Keywords: dielectric barrier discharge (DBD); NO abatement; assistant reduction agent; DBD–SCR assisted by CH4 dielectric barrier discharge (DBD); NO abatement; assistant reduction agent; DBD–SCR assisted by CH4
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
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Zhao, W.; Liu, Y.; Wei, H.; Zhang, R.; Luo, G.; Hou, H.; Chen, S.; Zhang, R. NO Removal by Plasma-Enhanced NH3-SCR Using Methane as an Assistant Reduction Agent at Low Temperature. Appl. Sci. 2019, 9, 2751.

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