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Article

Multi-Scale Structural Response in Calligraphic Layout Deviation Detection

School of Computer Science and Software Engineering, Nanjing University of Information Science and Technology, Nanjing 210044, China
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Appl. Sci. 2026, 16(7), 3346; https://doi.org/10.3390/app16073346
Submission received: 2 March 2026 / Revised: 24 March 2026 / Accepted: 28 March 2026 / Published: 30 March 2026
(This article belongs to the Section Computing and Artificial Intelligence)

Abstract

Structural deviation detection in calligraphic layout is an important problem in intelligent calligraphy tutoring systems. Existing approaches typically rely on isolated geometric or pixel-level statistics and lack a unified representation across spatial levels and scales. To address this issue, this study formulated a layout analysis for hard-pen regular script written in Tianzigē grids as a structural deviation detection task. A continuous writing density field was first constructed from the binary stroke foreground, and a three-level spatial partition consisting of page level, row-column level, and single cell level regions was established. Multi-scale structural responses (MSRs) were then computed within these regions to characterize layout deviations in a unified manner. Under controlled parametric perturbations, an original dataset of 1200 pages was evaluated to assess detection performance. In repeated experiments, the joint MSR features achieved an AUC of 0.94 and an F1-score of 0.90, outperforming geometric, pixel-statistical, page-level structural, and traditional machine-learning baselines. The results indicate that multi-level MSRs provide complementary structural information for reliable layout deviation detection and offer a useful basis for hierarchical diagnostic feedback in intelligent calligraphy tutoring systems.
Keywords: calligraphy evaluation; layout deviation detection; multi-scale structural response; kernel density estimation; fractal analysis; document layout modeling; intelligent education calligraphy evaluation; layout deviation detection; multi-scale structural response; kernel density estimation; fractal analysis; document layout modeling; intelligent education

Share and Cite

MDPI and ACS Style

Shen, X.; Xu, Z.; Dai, L.; Niu, Y. Multi-Scale Structural Response in Calligraphic Layout Deviation Detection. Appl. Sci. 2026, 16, 3346. https://doi.org/10.3390/app16073346

AMA Style

Shen X, Xu Z, Dai L, Niu Y. Multi-Scale Structural Response in Calligraphic Layout Deviation Detection. Applied Sciences. 2026; 16(7):3346. https://doi.org/10.3390/app16073346

Chicago/Turabian Style

Shen, Xun, Zhanyang Xu, Liangchen Dai, and Yaohui Niu. 2026. "Multi-Scale Structural Response in Calligraphic Layout Deviation Detection" Applied Sciences 16, no. 7: 3346. https://doi.org/10.3390/app16073346

APA Style

Shen, X., Xu, Z., Dai, L., & Niu, Y. (2026). Multi-Scale Structural Response in Calligraphic Layout Deviation Detection. Applied Sciences, 16(7), 3346. https://doi.org/10.3390/app16073346

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