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Journal: Appl. Sci., 2023
Volume: 13
Number: 9533

Article: Plasma Ion Bombardment Induced Heat Flux on the Wafer Surface in Inductively Coupled Plasma Reactive Ion Etch
Authors: by Sung Il Cho, Hyun Keun Park, Surin An and Sang Jeen Hong
Link: https://www.mdpi.com/2076-3417/13/17/9533

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