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Journal: Appl. Sci., 2021
Volume: 11
Number: 4295

Article: Influence of Applied Stress on the Ferroelectricity of Thin Zr-Doped HfO2 Films
Authors: by Yuwei Cai, Qingzhu Zhang, Zhaohao Zhang, Gaobo Xu, Zhenhua Wu, Jie Gu, Junjie Li, Jinjuan Xiang and Huaxiang Yin
Link: https://www.mdpi.com/2076-3417/11/9/4295

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