Article Versions Notes

Cai Y, Zhang Q, Zhang Z, Xu G, Wu Z, Gu J, Li J, Xiang J, Yin H. Influence of Applied Stress on the Ferroelectricity of Thin Zr-Doped HfO₂ Films. Applied Sciences. 2021; 11(9):4295. https://doi.org/10.3390/app11094295

Cai, Yuwei, Qingzhu Zhang, Zhaohao Zhang, Gaobo Xu, Zhenhua Wu, Jie Gu, Junjie Li, Jinjuan Xiang, and Huaxiang Yin. 2021. "Influence of Applied Stress on the Ferroelectricity of Thin Zr-Doped HfO₂ Films" Applied Sciences 11, no. 9: 4295. https://doi.org/10.3390/app11094295

Cai, Y., Zhang, Q., Zhang, Z., Xu, G., Wu, Z., Gu, J., Li, J., Xiang, J., & Yin, H. (2021). Influence of Applied Stress on the Ferroelectricity of Thin Zr-Doped HfO₂ Films. Applied Sciences, 11(9), 4295. https://doi.org/10.3390/app11094295