Order Article Reprints

Jeong G-P, Son Y-H, Park J-S, Kim P-S, Han M-H, Hong S-W, Park J-H, Cui H, Yoon B-U, Park J-G. Fenton Reaction for Enhancing Polishing Rate and Protonated Amine Functional Group Polymer for Inhibiting Corrosion in Ge₁Sb₄Te₅ Film Surface Chemical-Mechanical-Planarization. Applied Sciences. 2021; 11(22):10872. https://doi.org/10.3390/app112210872

Jeong, Gi-Ppeum, Young-Hye Son, Jun-Seong Park, Pil-Su Kim, Man-Hyup Han, Seong-Wan Hong, Jin-Hyung Park, Hao Cui, Bo-Un Yoon, and Jea-Gun Park. 2021. "Fenton Reaction for Enhancing Polishing Rate and Protonated Amine Functional Group Polymer for Inhibiting Corrosion in Ge₁Sb₄Te₅ Film Surface Chemical-Mechanical-Planarization" Applied Sciences 11, no. 22: 10872. https://doi.org/10.3390/app112210872

Jeong, G.-P., Son, Y.-H., Park, J.-S., Kim, P.-S., Han, M.-H., Hong, S.-W., Park, J.-H., Cui, H., Yoon, B.-U., & Park, J.-G. (2021). Fenton Reaction for Enhancing Polishing Rate and Protonated Amine Functional Group Polymer for Inhibiting Corrosion in Ge₁Sb₄Te₅ Film Surface Chemical-Mechanical-Planarization. Applied Sciences, 11(22), 10872. https://doi.org/10.3390/app112210872