Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode
Abstract
:1. Introduction
2. Materials and Methods
3. Results
4. Conclusions
Author Contributions
Funding
Conflicts of Interest
References
- Lee, S.; Doxbeck, M.; Mueller, J.; Cipollo, M.; Cote, P. Texture, structure and phase transformation in sputter beta tantalum coating. Surf. Coat. Technol. 2004, 177, 44–51. [Google Scholar] [CrossRef] [Green Version]
- Niu, Y.; Chen, M.; Wang, J.; Yang, L.; Guo, C.; Zhu, S.; Wang, F. Preparation and thermal shock performance of thick α-Ta coatings by direct current magnetron sputtering (DCMS). Surf. Coat. Technol. 2017, 321, 19–25. [Google Scholar] [CrossRef]
- Shiri, S.; Zhang, C.; Odeshi, A.; Yang, Q. Growth and characterization of tantalum multilayer thin films on CoCrMo alloy for orthopedic implant applications. Thin Solid Films 2018, 645, 405–408. [Google Scholar] [CrossRef]
- Matson, D.W.; McClanahan, E.D.; Lee, S.L.; Windover, D. Properties of thick sputtered Ta used for protective gun tube coatings. Surf. Coat. Technol. 2001, 146, 344–350. [Google Scholar] [CrossRef]
- Hee, A.C.; Jamali, S.S.; Bendavid, A.; Martin, P.J.; Kong, C.; Zhao, Y. Corrosion behaviour and adhesion properties of sputtered tantalum coating on Ti6Al4V substrate. Surf. Coat. Technol. 2016, 307, 666–675. [Google Scholar] [CrossRef]
- Yang, S.; Yang, F.; Chen, M.; Niu, Y.; Zhu, S.; Wang, F. Effect of Nitrogen Doping on Microstructure and Wear Resistance of Tantalum Coatings Deposited by Direct Current Magnetron Sputtering. Acta Metall. Sin. 2018, 55, 308–316. [Google Scholar]
- Ino, K.; Shinohara, T.; Ushiki, T.; Ohmi, T. Ion energy, ion flux, and ion species effects on crystallographic and electrical properties of sputter-deposited Ta thin films. J. Vac. Sci. Technol. A Vac. Surf. Films 1997, 15, 2627–2635. [Google Scholar] [CrossRef]
- Ellis, E.A.; Chmielus, M.; Baker, S.P. Effect of sputter pressure on Ta thin films: Beta phase formation, texture, and stresses. Acta Mater. 2018, 150, 317–326. [Google Scholar] [CrossRef]
- Colin, J.J.; Abadias, G.; Michel, A.; Jaouen, C. On the origin of the metastable β-Ta phase stabilization in tantalum sputtered thin films. Acta Mater. 2017, 126, 481–493. [Google Scholar] [CrossRef]
- Ellis, E.A.; Chmielus, M.; Han, S.; Baker, S.P. Effect of sputter pressure on microstructure and properties of β-Ta thin films. Acta Mater. 2020, 183, 504–513. [Google Scholar] [CrossRef]
- Hallmann, L.; Ulmer, P. Effect of sputtering parameters and substrate composition on the structure of tantalum thin films. Appl. Surf. Sci. 2013, 282, 1–6. [Google Scholar] [CrossRef]
- Ehiasarian, A.; New, R.; Münz, W.-D.; Hultman, L.; Helmersson, U.; Kouznetsov, V. Influence of high power densities on the composition of pulsed magnetron plasmas. Vacuum 2002, 65, 147–154. [Google Scholar] [CrossRef]
- Helmersson, U.; Lattemann, M.; Bohlmark, J.; Ehiasarian, A.P.; Gudmundsson, J.T. Ionized physical vapor deposition (IPVD): A review of technology and applications. Thin Solid Films 2006, 513, 1–24. [Google Scholar] [CrossRef] [Green Version]
- Kouznetsov, V.; Macak, K.; Schneider, J.M.; Helmersson, U.; Petrov, I. A novel pulsed magnetron sputter technique utilizing very high target power densities. Surf. Coat. Technol. 1999, 122, 290–293. [Google Scholar] [CrossRef]
- Lundin, D.; Sarakinos, K. An introduction to thin film processing using high-power impulse magnetron sputtering. J. Mater. Res. 2012, 27, 780–792. [Google Scholar] [CrossRef] [Green Version]
- Lin, J.; Moore, J.J.; Sproul, W.D.; Mishra, B.; Wu, Z. Modulated pulse power sputtered chromium coatings. Thin Solid Films 2009, 518, 1566–1570. [Google Scholar] [CrossRef]
- Lin, J.; Moore, J.; Sproul, W.; Mishra, B.; Rees, J.; Wu, Z.; Chistyakov, R.; Abraham, B. Ion energy and mass distributions of the plasma during modulated pulse power magnetron sputtering. Surf. Coat. Technol. 2009, 203, 3676–3685. [Google Scholar] [CrossRef]
- Lin, J.; Sproul, W.D.; Moore, J.J.; Wu, Z.; Lee, S.; Chistyakov, R.; Abraham, B. Recent advances in modulated pulsed power magnetron sputtering for surface engineering. Jom 2011, 63, 48–58. [Google Scholar] [CrossRef]
- Alami, J.; Eklund, P.; Andersson, J.M.; Lattemann, M.; Wallin, E.; Bohlmark, J.; Persson, P.; Helmersson, U. Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering. Thin Solid Films 2007, 515, 3434–3438. [Google Scholar] [CrossRef] [Green Version]
- Lin, J.; Moore, J.J.; Sproul, W.D.; Lee, S.L.; Wang, J. Effect of negative substrate bias on the structure and properties of Ta coatings deposited using modulated pulse power magnetron sputtering. IEEE Trans. Plasma Sci. 2010, 38, 3071–3078. [Google Scholar] [CrossRef]
- Ferreira, F.; Serra, R.; Oliveira, J.; Cavaleiro, A. Effect of peak target power on the properties of Cr thin films sputtered by HiPIMS in deep oscillation magnetron sputtering (DOMS) mode. Surf. Coat. Technol. 2014, 258, 249–256. [Google Scholar] [CrossRef]
- Ferreira, F.; Oliveira, J.; Cavaleiro, A. CrN thin films deposited by HiPIMS in DOMS mode. Surf. Coat. Technol. 2016, 291, 365–375. [Google Scholar] [CrossRef]
- Lin, J.; Sproul, W.D. Structure and properties of Cr2O3 coatings deposited using DCMS, PDCMS, and DOMS. Surf. Coat. Technol. 2015, 276, 70–76. [Google Scholar] [CrossRef]
- Lin, J.; Wang, B.; Sproul, W.D.; Ou, Y.; Dahan, I. Anatase and rutile TiO2 films deposited by arc-free deep oscillation magnetron sputtering. J. Phys. D Appl. Phys. 2013, 46, 084008. [Google Scholar] [CrossRef]
- Oliveira, J.; Fernandes, F.; Ferreira, F.; Cavaleiro, A. Tailoring the nanostructure of Ti–Si–N thin films by HiPIMS in deep oscillation magnetron sputtering (DOMS) mode. Surf. Coat. Technol. 2015, 264, 140–149. [Google Scholar] [CrossRef]
- Ren, H.; Sosnowski, M. Tantalum thin films deposited by ion assisted magnetron sputtering. Thin Solid Films 2008, 516, 1898–1905. [Google Scholar] [CrossRef]
- Feinstein, L.; Huttemann, R. Factors controlling the structure of sputtered Ta films. Thin Solid Films 1973, 16, 129–145. [Google Scholar] [CrossRef]
- Catania, P.; Roy, R.A.; Cuomo, J.J. Phase formation and microstructure changes in tantalum thin films induced by bias sputtering. J. Appl. Phys. 1993, 74, 1008–1014. [Google Scholar] [CrossRef]
- Roy, R.; Catania, P.; Saenger, K.; Cuomo, J.; Lossy, R. Role of energetic atoms and ions in Ta films grown by different physical vapor deposition methods. J. Vac. Sci. Technol. B Microelectron. Nanometer Struct. Process. Meas. Phenom. 1993, 11, 1921–1927. [Google Scholar] [CrossRef]
- Myers, S.; Lin, J.; Souza, R.M.; Sproul, W.D.; Moore, J.J. The β to α phase transition of tantalum coatings deposited by modulated pulsed power magnetron sputtering. Surf. Coat. Technol. 2013, 214, 38–45. [Google Scholar] [CrossRef]
- Anders, A. A structure zone diagram including plasma-based deposition and ion etching. Thin Solid Films 2010, 518, 4087–4090. [Google Scholar] [CrossRef] [Green Version]
- Navid, A.; Hodge, A. Controllable residual stresses in sputtered nanostructured alpha-tantalum. Scr. Mater. 2010, 63, 867–870. [Google Scholar] [CrossRef]
- Shiri, S.; Odeshi, A.; Chen, N.; Feng, R.; Sutarto, R.; Yang, Q. FCC tantalum thin films deposited by magnetron sputtering. Surf. Coat. Technol. 2019, 358, 942–946. [Google Scholar] [CrossRef]
DCint (V) | Vp (V) | Ip (A) | Pp (kW) | Fi (Hz) | Bias (V) | Dep. Time (min) |
---|---|---|---|---|---|---|
400 | 1296 | 101 | 131 | 120 | - | 115 |
1298 | 100 | 130 | 121 | −30 | 115 | |
1285 | 103 | 132 | 123 | −50 | 125 | |
1290 | 100 | 129 | 119 | −80 | 125 | |
1296 | 100 | 130 | 120 | −120 | 144 |
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Ferreira, F.; Cavaleiro, A.; Oliveira, J. Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode. Metals 2020, 10, 1618. https://doi.org/10.3390/met10121618
Ferreira F, Cavaleiro A, Oliveira J. Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode. Metals. 2020; 10(12):1618. https://doi.org/10.3390/met10121618
Chicago/Turabian StyleFerreira, Fábio, Albano Cavaleiro, and João Oliveira. 2020. "Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode" Metals 10, no. 12: 1618. https://doi.org/10.3390/met10121618