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Journal: Polymers, 2026
Volume: 18
Number: 1899

Article: Poly(acrylic acid)-Containing Ceria Slurries for Shallow Trench Isolation Chemical Mechanical Polishing: Colloidal Stability, Planarization Efficiency, and Selectivity
Authors: by Sohee Hwang, Tao Lyu and Woonjung Kim
Link: https://www.mdpi.com/2073-4360/18/15/1899

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