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Journal: Polymers, 2024
Volume: 16
Number: 846

Article: Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems
Authors: by Zaoxia Wen, Xingyu Liu, Wenxiu Chen, Ruolin Zhou, Hao Wu, Yongmei Xia and Lianbin Wu
Link: https://www.mdpi.com/2073-4360/16/6/846

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