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Journal: Polymers, 2024
Volume: 16
Number: 846
Article:
Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems
Authors:
by
Zaoxia Wen, Xingyu Liu, Wenxiu Chen, Ruolin Zhou, Hao Wu, Yongmei Xia and Lianbin Wu
Link:
https://www.mdpi.com/2073-4360/16/6/846
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