Liu, J.; Wang, D.; Li, Y.; Wang, H.; Chen, H.; Wang, Q.; Kang, W.
Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists. Polymers 2024, 16, 825.
https://doi.org/10.3390/polym16060825
AMA Style
Liu J, Wang D, Li Y, Wang H, Chen H, Wang Q, Kang W.
Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists. Polymers. 2024; 16(6):825.
https://doi.org/10.3390/polym16060825
Chicago/Turabian Style
Liu, Junjun, Dong Wang, Yitan Li, Haihua Wang, Huan Chen, Qianqian Wang, and Wenbing Kang.
2024. "Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists" Polymers 16, no. 6: 825.
https://doi.org/10.3390/polym16060825
APA Style
Liu, J., Wang, D., Li, Y., Wang, H., Chen, H., Wang, Q., & Kang, W.
(2024). Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists. Polymers, 16(6), 825.
https://doi.org/10.3390/polym16060825