Ferreira, C.A.M.; Guerreiro, S.F.C.; Valente, J.F.A.; PatrÃcio, T.M.F.; Alves, N.; Mateus, A.; Dias, J.R.
Advanced Face Mask Filters Based on PCL Electrospun Meshes Dopped with Antimicrobial MgO and CuO Nanoparticles. Polymers 2022, 14, 3329.
https://doi.org/10.3390/polym14163329
AMA Style
Ferreira CAM, Guerreiro SFC, Valente JFA, PatrÃcio TMF, Alves N, Mateus A, Dias JR.
Advanced Face Mask Filters Based on PCL Electrospun Meshes Dopped with Antimicrobial MgO and CuO Nanoparticles. Polymers. 2022; 14(16):3329.
https://doi.org/10.3390/polym14163329
Chicago/Turabian Style
Ferreira, Carolina A. M., Sara F. C. Guerreiro, Joana F. A. Valente, Tatiana M. F. PatrÃcio, Nuno Alves, Artur Mateus, and Juliana R. Dias.
2022. "Advanced Face Mask Filters Based on PCL Electrospun Meshes Dopped with Antimicrobial MgO and CuO Nanoparticles" Polymers 14, no. 16: 3329.
https://doi.org/10.3390/polym14163329
APA Style
Ferreira, C. A. M., Guerreiro, S. F. C., Valente, J. F. A., PatrÃcio, T. M. F., Alves, N., Mateus, A., & Dias, J. R.
(2022). Advanced Face Mask Filters Based on PCL Electrospun Meshes Dopped with Antimicrobial MgO and CuO Nanoparticles. Polymers, 14(16), 3329.
https://doi.org/10.3390/polym14163329