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Crystals 2015, 5(1), 116-142;

Controlled Deposition of Tin Oxide and Silver Nanoparticles Using Microcontact Printing

Intel D1C Lithography Engineering, Intel Corporation, Ronler Acres, Hillsboro, OR 97124, USA
Department of Chemistry, Portland State University, Portland, OR 97207, USA
Author to whom correspondence should be addressed.
Academic Editor: Ramesh K. Guduru
Received: 2 October 2014 / Accepted: 4 February 2015 / Published: 13 February 2015
(This article belongs to the Special Issue Nanostructured Oxide Crystals)
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This report describes extensive studies of deposition processes involving tin oxide (SnOx) nanoparticles on smooth glass surfaces. We demonstrate the use of smooth films of these nanoparticles as a platform for spatially-selective electroless deposition of silver by soft lithographic stamping. The edge and height roughness of the depositing metallic films are 100 nm and 20 nm, respectively, controlled by the intrinsic size of the nanoparticles. Mixtures of alcohols as capping agents provide further control over the size and shape of nanoparticles clusters. The distribution of cluster heights obtained by atomic force microscopy (AFM) is modeled through a modified heterogeneous nucleation theory as well as Oswald ripening. The thermodynamic modeling of the wetting properties of nanoparticles aggregates provides insight into their mechanism of formation and how their properties might be further exploited in wide-ranging applications. View Full-Text
Keywords: nanoparticles; tin oxide; mirroring; soft lithography; AFM; wetting nanoparticles; tin oxide; mirroring; soft lithography; AFM; wetting

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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

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Chan, J.C.; Hannah-Moore, N.; Rananavare, S.B. Controlled Deposition of Tin Oxide and Silver Nanoparticles Using Microcontact Printing. Crystals 2015, 5, 116-142.

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