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Crystals
Volume 15
Issue 9
10.3390/cryst15090754
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Article

CFD-Based Optimization of the Growth Zone in an Industrial Ammonothermal GaN Autoclave for Uniform Flow and Temperature Fields

by
Marek Zak
*,
Pawel Kempisty
,
Boleslaw Lucznik
,
Robert Kucharski
and
Michal Bockowski
Institute of High Pressure Physics PAS, Sokolowska 29/37, 01-142 Warsaw, Poland
*
Author to whom correspondence should be addressed.
Crystals 2025, 15(9), 754; https://doi.org/10.3390/cryst15090754 (registering DOI)
Submission received: 4 August 2025 / Revised: 19 August 2025 / Accepted: 22 August 2025 / Published: 25 August 2025
Versions Notes

Abstract

This study presents a computational fluid dynamics (CFD) simulation to investigate fluid flow and heat transfer within the growth zone of gallium nitride crystals synthesized via the alkaline ammonothermal method, with particular emphasis on the influence of seed crystal arrangement and installation geometry. The model analyzes temperature and velocity distributions, highlighting how seed configuration affects turbulent and transitional flow behavior. Key findings demonstrate the effectiveness of CFD in evaluating and optimizing growth zone design. Both simulation and experimental results show that achieving more uniform flow and temperature fields leads to more consistent growth rates and improved structural crystal quality. Furthermore, the study underscores the critical role of installation geometry in shaping flow characteristics such as velocity distribution, temperature gradients, and their transient fluctuations, factors essential for optimizing the ammonothermal crystallization process.
Keywords: gallium nitride; ammonothermal crystal growth technology; convective flow; computational fluid dynamics gallium nitride; ammonothermal crystal growth technology; convective flow; computational fluid dynamics

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MDPI and ACS Style

Zak, M.; Kempisty, P.; Lucznik, B.; Kucharski, R.; Bockowski, M. CFD-Based Optimization of the Growth Zone in an Industrial Ammonothermal GaN Autoclave for Uniform Flow and Temperature Fields. Crystals 2025, 15, 754. https://doi.org/10.3390/cryst15090754

AMA Style

Zak M, Kempisty P, Lucznik B, Kucharski R, Bockowski M. CFD-Based Optimization of the Growth Zone in an Industrial Ammonothermal GaN Autoclave for Uniform Flow and Temperature Fields. Crystals. 2025; 15(9):754. https://doi.org/10.3390/cryst15090754

Chicago/Turabian Style

Zak, Marek, Pawel Kempisty, Boleslaw Lucznik, Robert Kucharski, and Michal Bockowski. 2025. "CFD-Based Optimization of the Growth Zone in an Industrial Ammonothermal GaN Autoclave for Uniform Flow and Temperature Fields" Crystals 15, no. 9: 754. https://doi.org/10.3390/cryst15090754

APA Style

Zak, M., Kempisty, P., Lucznik, B., Kucharski, R., & Bockowski, M. (2025). CFD-Based Optimization of the Growth Zone in an Industrial Ammonothermal GaN Autoclave for Uniform Flow and Temperature Fields. Crystals, 15(9), 754. https://doi.org/10.3390/cryst15090754

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