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Journal: Crystals, 2024
Volume: 14
Number: 782
Article:
Influence of the Acetylene Flow Rate and Process Pressure on the Carbon Deposition Behavior by Thermal Chemical Vapor Deposition Process
Authors:
by
Gi-Hoon Kwon, Byoungho Choi, Young-Kook Lee and Kyoungil Moon
Link:
https://www.mdpi.com/2073-4352/14/9/782
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