Valliyil Sasi, V.;                     Iqbal, A.;                     Chaik, K.;                     Iacopi, A.;                     Mohd-Yasin, F.    
        RF Sputtering, Post-Annealing Treatment and Characterizations of ZnO (002) Thin Films on 3C-SiC (111)/Si (111) Substrates. Micromachines 2017, 8, 148.
    https://doi.org/10.3390/mi8050148
    AMA Style
    
                                Valliyil Sasi V,                                 Iqbal A,                                 Chaik K,                                 Iacopi A,                                 Mohd-Yasin F.        
                RF Sputtering, Post-Annealing Treatment and Characterizations of ZnO (002) Thin Films on 3C-SiC (111)/Si (111) Substrates. Micromachines. 2017; 8(5):148.
        https://doi.org/10.3390/mi8050148
    
    Chicago/Turabian Style
    
                                Valliyil Sasi, Visakh,                                 Abid Iqbal,                                 Kien Chaik,                                 Alan Iacopi,                                 and Faisal Mohd-Yasin.        
                2017. "RF Sputtering, Post-Annealing Treatment and Characterizations of ZnO (002) Thin Films on 3C-SiC (111)/Si (111) Substrates" Micromachines 8, no. 5: 148.
        https://doi.org/10.3390/mi8050148
    
    APA Style
    
                                Valliyil Sasi, V.,                                 Iqbal, A.,                                 Chaik, K.,                                 Iacopi, A.,                                 & Mohd-Yasin, F.        
        
        (2017). RF Sputtering, Post-Annealing Treatment and Characterizations of ZnO (002) Thin Films on 3C-SiC (111)/Si (111) Substrates. Micromachines, 8(5), 148.
        https://doi.org/10.3390/mi8050148