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Micromachines 2015, 6(11), 1588-1596;

Rounding of Negative Dry Film Resist by Diffusive Backside Exposure Creating Rounded Channels for Pneumatic Membrane Valves

Polymeric Microsystems, Institute of Semiconductors and Microsystems, Technische Universität Dresden, 01062 Dresden, Germany
Author to whom correspondence should be addressed.
Academic Editor: Joost Lötters
Received: 7 September 2015 / Revised: 29 September 2015 / Accepted: 16 October 2015 / Published: 28 October 2015
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Processing of dry film resist is an easy, low-cost, and fast way to fabricate microfluidic structures. Currently, common processes are limited to creating solely rectangular channels. However, it has shown that rounded channels are necessary to ensure proper closing of pneumatic membrane valves for microfluidic devices. Here, we introduce a modification to the standard lithography process, in order to create rounded channels for microfluidic structures. Therefore, a diffuser element was inserted into in the optical path between the light source and glass substrate, which is then exposed through the backside, hence altering the exposure to the dry resist spatially. Characterization of the process was carried out with different exposure times, features sizes, and substrate thickness. The process modification is almost effortless and can be integrated in any lithography process. View Full-Text
Keywords: soft lithography; dry film resist; microfluidics soft lithography; dry film resist; microfluidics

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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

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Frank, P.; Haefner, S.; Paschew, G.; Richter, A. Rounding of Negative Dry Film Resist by Diffusive Backside Exposure Creating Rounded Channels for Pneumatic Membrane Valves. Micromachines 2015, 6, 1588-1596.

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