Next Article in Journal
Effects of Laser Operating Parameters on Piezoelectric Substrates Micromachining with Picosecond Laser
Next Article in Special Issue
Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography
Previous Article in Journal
Performance Characterization of Micromachined Inductive Suspensions Based on 3D Wire-Bonded Microcoils
Previous Article in Special Issue
SU-8 Photolithography as a Toolbox for Carbon MEMS
Article Menu

Export Article

Open AccessReview
Micromachines 2015, 6(1), 1-18;

Innovative SU-8 Lithography Techniques and Their Applications

Department of Electrical Engineering, University of Texas, Dallas, Richardson, TX 75080, USA
Siliconfile Technologies, Inc., Seongnam-si, Gyeonggi-do 463-050, Korea
Department of Information and Communication Engineering, Hanbat National University, Daejeon 305-719, Korea
Author to whom correspondence should be addressed.
Academic Editor: Arnaud Bertsch
Received: 3 October 2014 / Accepted: 9 December 2014 / Published: 23 December 2014
(This article belongs to the Special Issue 15 Years of SU8 as MEMS Material)
Full-Text   |   PDF [6689 KB, uploaded 23 December 2014]   |  


SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters) high-aspect-ratio (up to 100:1) 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovative unconventional lithography techniques to fully utilize the thick high aspect ratio nature of the SU-8 photoresist. Those unconventional lithography techniques include inclined ultraviolet (UV) exposure, back-side UV exposure, drawing lithography, and moving-mask UV lithography. In addition, since SU-8 is a negative-tone photoresist, it has been a popular choice of material for multiple-photon interference lithography for the periodic structure in scales down to deep sub-microns such as photonic crystals. These innovative lithography techniques for SU-8 have led to a lot of unprecedented capabilities for creating unique micro- and nano-structures. This paper reviews such innovative lithography techniques developed in the past 15 years or so. View Full-Text
Keywords: SU-8; lithography; backside; inclined; holographic interference SU-8; lithography; backside; inclined; holographic interference

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

Share & Cite This Article

MDPI and ACS Style

Lee, J.B.; Choi, K.-H.; Yoo, K. Innovative SU-8 Lithography Techniques and Their Applications. Micromachines 2015, 6, 1-18.

Show more citation formats Show less citations formats

Related Articles

Article Metrics

Article Access Statistics



[Return to top]
Micromachines EISSN 2072-666X Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top