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Micromachines 2013, 4(4), 370-377;

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne 1015, Switzerland
Institute of Physics, University of Basel, Klingelbergstrasse 82, Basel CH-4056, Switzerland
Author to whom correspondence should be addressed.
Received: 5 May 2013 / Revised: 27 July 2013 / Accepted: 10 October 2013 / Published: 15 October 2013
(This article belongs to the Special Issue Micromachined Tools for Nanoscale Science and Technology)
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In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the stamps reproduce the membrane aperture patterns within ±10 nm and we validate such stamps by using them to fabricate metallic nanowires down to 100 nm in size. View Full-Text
Keywords: nanostencil lithography; nanoimprint lithography; nanowires nanostencil lithography; nanoimprint lithography; nanowires

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This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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Villanueva, L.G.; Vazquez-Mena, O.; Martin-Olmos, C.; Savu, V.; Sidler, K.; Brugger, J. Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography. Micromachines 2013, 4, 370-377.

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