Article Versions Notes

Luo Y, Zheng X, Li G, Shubin I, Thacker H, Yao J, Lee J-H, Feng D, Fong J, Kung C-C, et al. Strong Electro-Absorption in GeSi Epitaxy on Silicon-on-Insulator (SOI). Micromachines. 2012; 3(2):345-363. https://doi.org/10.3390/mi3020345

Luo, Ying, Xuezhe Zheng, Guoliang Li, Ivan Shubin, Hiren Thacker, Jin Yao, Jin-Hyoung Lee, Dazeng Feng, Joan Fong, Cheng-Chih Kung, and et al. 2012. "Strong Electro-Absorption in GeSi Epitaxy on Silicon-on-Insulator (SOI)" Micromachines 3, no. 2: 345-363. https://doi.org/10.3390/mi3020345

Luo, Y., Zheng, X., Li, G., Shubin, I., Thacker, H., Yao, J., Lee, J.-H., Feng, D., Fong, J., Kung, C.-C., Liao, S., Shafiiha, R., Asghari, M., Raj, K., Krishnamoorthy, A. V., & Cunningham, J. E. (2012). Strong Electro-Absorption in GeSi Epitaxy on Silicon-on-Insulator (SOI). Micromachines, 3(2), 345-363. https://doi.org/10.3390/mi3020345