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Journal: Micromachines, 2025
Volume: 16
Number: 1091
1091
Article: Optimizing Annealing Temperature for Enhanced Electrical Performance and Stability of Solution-Processed In₂O₃ Thin-Film Transistors
Authors: by Taehui Kim, Seullee Lee, Ye-Won Lee, Dongwook Kim, Youngjun Yun, Jin-Hyuk Bae, Hyeonju Lee and Jaehoon Park
Link: https://www.mdpi.com/2072-666X/16/10/1091

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