Hyun, D.; Lee, H.-L.; Moon, Y.-J.; Hwang, J.-Y.; Moon, S.-J.
Pulsed Laser Ablation Characteristics of Light-Absorbing Mask Layer Based on Coating Thicknesses under Laser Lift-Off Patterning Process. Micromachines 2024, 15, 747.
https://doi.org/10.3390/mi15060747
AMA Style
Hyun D, Lee H-L, Moon Y-J, Hwang J-Y, Moon S-J.
Pulsed Laser Ablation Characteristics of Light-Absorbing Mask Layer Based on Coating Thicknesses under Laser Lift-Off Patterning Process. Micromachines. 2024; 15(6):747.
https://doi.org/10.3390/mi15060747
Chicago/Turabian Style
Hyun, Daehee, Hee-Lak Lee, Yoon-Jae Moon, Jun-Young Hwang, and Seung-Jae Moon.
2024. "Pulsed Laser Ablation Characteristics of Light-Absorbing Mask Layer Based on Coating Thicknesses under Laser Lift-Off Patterning Process" Micromachines 15, no. 6: 747.
https://doi.org/10.3390/mi15060747
APA Style
Hyun, D., Lee, H.-L., Moon, Y.-J., Hwang, J.-Y., & Moon, S.-J.
(2024). Pulsed Laser Ablation Characteristics of Light-Absorbing Mask Layer Based on Coating Thicknesses under Laser Lift-Off Patterning Process. Micromachines, 15(6), 747.
https://doi.org/10.3390/mi15060747