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Open AccessArticle

Robust Tracking of a Cost-Effective Micro-Stereolithography System Based on a Compliant Nanomanipulator

by Yue Cao 1 and Zhen Zhang 1,2,*
State Key Laboratory of Tribology & Institute of Manufacturing Engineering, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
Beijing Key Laboratory of Precision/Ultra-Precision Manufacturing Equipment and Control, Tsinghua University, Beijing 100084, China
Author to whom correspondence should be addressed.
This paper is an extended version of our paper published in “Manipulation, Manufacturing and Measurement on the Nanoscale 2019”.
Micromachines 2019, 10(11), 785;
Received: 25 October 2019 / Revised: 11 November 2019 / Accepted: 13 November 2019 / Published: 16 November 2019
(This article belongs to the Special Issue Manipulation, Manufacturing and Measurement on the Nanoscale 2019)
Micro-stereolithography (MSL) has emerged as a promising and challenging technique in micro-/nano-scale additive manufacturing. Besides the requirement of the light source, the motion system requires ultra-high-precision tracking capability to reach the right location for every solidification event. To achieve single-digit micron feature size of the fabrication, we propose a robust control strategy to support a self-developed cost-effective MSL prototype based on a compliant nanomanipulator and a blue light-emitting diode (LED) module. In particular, the nonlinearity and parameter-variation of the compliant manipulator are dealt with by a robust radial basis function (RBF)-based neural network, and the repetitive control (RC) is innovatively integrated with RBF to improve the tracking performance of a closed pattern. Various simulations and real-time experiments are conducted to validate the proposed control strategy. The fabrication of a closed pattern will not begin by turning on the laser source until the tracking error reaches submicrons, and the fabrication results demonstrate that the cost-effective MSL system is capable of fabricating 2.5 µm feature size in a 0.5 mm working range. View Full-Text
Keywords: micro-stereolithography (MSL); compliant nanomanipulator; tracking micro-stereolithography (MSL); compliant nanomanipulator; tracking
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Cao, Y.; Zhang, Z. Robust Tracking of a Cost-Effective Micro-Stereolithography System Based on a Compliant Nanomanipulator. Micromachines 2019, 10, 785.

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