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Open AccessArticle

Robust Tracking of a Cost-Effective Micro-Stereolithography System Based on a Compliant Nanomanipulator

by Yue Cao 1 and Zhen Zhang 1,2,*
1
State Key Laboratory of Tribology & Institute of Manufacturing Engineering, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
2
Beijing Key Laboratory of Precision/Ultra-Precision Manufacturing Equipment and Control, Tsinghua University, Beijing 100084, China
*
Author to whom correspondence should be addressed.
This paper is an extended version of our paper published in “Manipulation, Manufacturing and Measurement on the Nanoscale 2019”.
Micromachines 2019, 10(11), 785; https://doi.org/10.3390/mi10110785
Received: 25 October 2019 / Revised: 11 November 2019 / Accepted: 13 November 2019 / Published: 16 November 2019
(This article belongs to the Special Issue Manipulation, Manufacturing and Measurement on the Nanoscale 2019)
Micro-stereolithography (MSL) has emerged as a promising and challenging technique in micro-/nano-scale additive manufacturing. Besides the requirement of the light source, the motion system requires ultra-high-precision tracking capability to reach the right location for every solidification event. To achieve single-digit micron feature size of the fabrication, we propose a robust control strategy to support a self-developed cost-effective MSL prototype based on a compliant nanomanipulator and a blue light-emitting diode (LED) module. In particular, the nonlinearity and parameter-variation of the compliant manipulator are dealt with by a robust radial basis function (RBF)-based neural network, and the repetitive control (RC) is innovatively integrated with RBF to improve the tracking performance of a closed pattern. Various simulations and real-time experiments are conducted to validate the proposed control strategy. The fabrication of a closed pattern will not begin by turning on the laser source until the tracking error reaches submicrons, and the fabrication results demonstrate that the cost-effective MSL system is capable of fabricating 2.5 µm feature size in a 0.5 mm working range. View Full-Text
Keywords: micro-stereolithography (MSL); compliant nanomanipulator; tracking micro-stereolithography (MSL); compliant nanomanipulator; tracking
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MDPI and ACS Style

Cao, Y.; Zhang, Z. Robust Tracking of a Cost-Effective Micro-Stereolithography System Based on a Compliant Nanomanipulator. Micromachines 2019, 10, 785.

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