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Journal: Materials, 2015
Volume: 8
Number: 5112

Article: Work Function Adjustment by Using Dipole Engineering for TaN-Al2O3-Si3N4-HfSiOx-Silicon Nonvolatile Memory
Authors: by Yu-Hsien Lin and Yi-Yun Yang
Link: https://www.mdpi.com/1996-1944/8/8/5112

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