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Journal: MaterialsVolume: 8Number: 5454
Article: Electrical Properties and Interfacial Studies of HfxTi1–xO2 High Permittivity Gate Insulators Deposited on Germanium Substrates
  • Authors:
  • Qifeng Lu1,
  • Yifei Mu1 and
  • Joseph W. Roberts2
  • et al.
Link: https://www.mdpi.com/1996-1944/8/12/5454

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