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Journal: Materials, 2015
Volume: 8
Number: 5454
Article:
Electrical Properties and Interfacial Studies of HfxTi1–xO2 High Permittivity Gate Insulators Deposited on Germanium Substrates
Authors:
by
Qifeng Lu, Yifei Mu, Joseph W. Roberts, Mohammed Althobaiti, Vinod R. Dhanak, Jingjin Wu, Chun Zhao, Ce Zhou Zhao, Qian Zhang, Li Yang, Ivona Z. Mitrovic, Stephen Taylor and Paul R. Chalker
Link:
https://www.mdpi.com/1996-1944/8/12/5454
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