Next Article in Journal
Investigation on the Residual Stress State of Drawn Tubes by Numerical Simulation and Neutron Diffraction Analysis
Previous Article in Journal
Hydrogen Bonding-Mediated Microphase Separation during the Formation of Mesoporous Novolac-Type Phenolic Resin Templated by the Triblock Copolymer, PEO-b-PPO-b-PEO
Previous Article in Special Issue
Photonic Paint Developed with Metallic Three-Dimensional Photonic Crystals
Open AccessReview

Magneto-Optical Thin Films for On-Chip Monolithic Integration of Non-Reciprocal Photonic Devices

1
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, No. 4 Sec. 2 Jianshe N. Street, Chengdu 610054, China
2
Department of Materials Science & Engineering, University of Delaware, 305 DuPont Hall, Newark, DE 19716, USA
3
Department of Materials Science & Engineering, Massachusetts Institute of Technology, 77 Massachusetts Ave., Cambridge, MA 02139, USA
*
Author to whom correspondence should be addressed.
Current Address: Huawei Technologies Co., Ltd., Bantian, Longgang District, Shenzhen 518129, China
††
Current Address: Samsung Electronics Co., Ltd., Mt. 14-1, Nongseo-Dong, Giheung-Gu, Yongin-Si, Gyeonggi-Do 449-712, Korea
Materials 2013, 6(11), 5094-5117; https://doi.org/10.3390/ma6115094
Received: 8 July 2013 / Revised: 9 September 2013 / Accepted: 6 October 2013 / Published: 8 November 2013
(This article belongs to the Special Issue Photonic Materials and Applications)
Achieving monolithic integration of nonreciprocal photonic devices on semiconductor substrates has been long sought by the photonics research society. One way to achieve this goal is to deposit high quality magneto-optical oxide thin films on a semiconductor substrate. In this paper, we review our recent research activity on magneto-optical oxide thin films toward the goal of monolithic integration of nonreciprocal photonic devices on silicon. We demonstrate high Faraday rotation at telecommunication wavelengths in several novel magnetooptical oxide thin films including Co substituted CeO2−δ, Co- or Fe-substituted SrTiO3−δ, as well as polycrystalline garnets on silicon. Figures of merit of 3~4 deg/dB and 21 deg/dB are achieved in epitaxial Sr(Ti0.2Ga0.4Fe0.4)O3−δ and polycrystalline (CeY2)Fe5O12 films, respectively. We also demonstrate an optical isolator on silicon, based on a racetrack resonator using polycrystalline (CeY2)Fe5O12/silicon strip-loaded waveguides. Our work demonstrates that physical vapor deposited magneto-optical oxide thin films on silicon can achieve high Faraday rotation, low optical loss and high magneto-optical figure of merit, therefore enabling novel high-performance non-reciprocal photonic devices monolithically integrated on semiconductor substrates. View Full-Text
Keywords: monolithic integration; magneto-optics; magnetic oxides; thin films; optical isolator; optical resonator monolithic integration; magneto-optics; magnetic oxides; thin films; optical isolator; optical resonator
Show Figures

Figure 1

MDPI and ACS Style

Bi, L.; Hu, J.; Jiang, P.; Kim, H.S.; Kim, D.H.; Onbasli, M.C.; Dionne, G.F.; Ross, C.A. Magneto-Optical Thin Films for On-Chip Monolithic Integration of Non-Reciprocal Photonic Devices. Materials 2013, 6, 5094-5117.

Show more citation formats Show less citations formats

Article Access Map by Country/Region

1
Only visits after 24 November 2015 are recorded.
Back to TopTop