Tsai, D.-C.; Huang, R.-H.; Chang, Z.-C.; Chen, E.-C.; Huang, Y.-L.; Shieu, F.-S.
Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering. Materials 2025, 18, 1671.
https://doi.org/10.3390/ma18071671
AMA Style
Tsai D-C, Huang R-H, Chang Z-C, Chen E-C, Huang Y-L, Shieu F-S.
Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering. Materials. 2025; 18(7):1671.
https://doi.org/10.3390/ma18071671
Chicago/Turabian Style
Tsai, Du-Cheng, Rong-Hsin Huang, Zue-Chin Chang, Erh-Chiang Chen, Yen-Lin Huang, and Fuh-Sheng Shieu.
2025. "Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering" Materials 18, no. 7: 1671.
https://doi.org/10.3390/ma18071671
APA Style
Tsai, D.-C., Huang, R.-H., Chang, Z.-C., Chen, E.-C., Huang, Y.-L., & Shieu, F.-S.
(2025). Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering. Materials, 18(7), 1671.
https://doi.org/10.3390/ma18071671