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Journal: Materials, 2025
Volume: 18
Number: 2615
2615
Article: Optimization of Diamond Polishing Process for Sub-Nanometer Roughness Using Ar/O₂/SF₆ Plasma
Authors: by Lei Zhao, Xiangbing Wang, Minxing Jiang, Chao Zhao, Nan Jiang, Kazhihito Nishimura, Jian Yi and Shuangquan Fang
Link: https://www.mdpi.com/1996-1944/18/11/2615

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