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Journal: Materials, 2023
Volume: 16
Number: 7172
Article:
Influence of NF3 Plasma-Treated HfO2 Gate Insulator Surface on Tin Oxide Thin-Film Transistors
Authors:
by
Christophe Avis and Jin Jang
Link:
https://www.mdpi.com/1996-1944/16/22/7172
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