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Matkivskyi V, Leiviskä O, Wenner S, Liu H, Vähänissi V, Savin H, Di Sabatino M, Tranell G. Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications—Effects of Precursor and Operating Conditions. Materials. 2023; 16(16):5522. https://doi.org/10.3390/ma16165522

Matkivskyi, Vladyslav, Oskari Leiviskä, Sigurd Wenner, Hanchen Liu, Ville Vähänissi, Hele Savin, Marisa Di Sabatino, and Gabriella Tranell. 2023. "Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications—Effects of Precursor and Operating Conditions" Materials 16, no. 16: 5522. https://doi.org/10.3390/ma16165522

Matkivskyi, V., Leiviskä, O., Wenner, S., Liu, H., Vähänissi, V., Savin, H., Di Sabatino, M., & Tranell, G. (2023). Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications—Effects of Precursor and Operating Conditions. Materials, 16(16), 5522. https://doi.org/10.3390/ma16165522