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Journal: Materials, 2023
Volume: 16
Number: 5112
5112
Article: Enhancing the Plasma-Resistance Properties of Li₂O–Al₂O₃–SiO₂ Glasses for the Semiconductor Etch Process via Alkaline Earth Oxide Incorporation
Authors: by So-Won Kim, Hwan-Seok Lee, Deok-Sung Jun, Seong-Eui Lee, Joung-Ho Lee and Hee-Chul Lee
Link: https://www.mdpi.com/1996-1944/16/14/5112

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