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Journal: Materials, 2023
Volume: 16
Number: 4077

Article: Atomic Layer Deposition of HfO2 Films Using TDMAH and Water or Ammonia Water
Authors: by Sylwia Gieraltowska, Lukasz Wachnicki, Piotr Dluzewski, Bartlomiej S. Witkowski, Marek Godlewski and Elzbieta Guziewicz
Link: https://www.mdpi.com/1996-1944/16/11/4077

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