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Journal: Materials, 2022
Volume: 15
Number: 1300
Article:
Investigation of SiO2 Etch Characteristics by C6F6/Ar/O2 Plasmas Generated Using Inductively Coupled Plasma and Capacitively Coupled Plasma
Authors:
by
Dain Sung, Long Wen, Hyunwoo Tak, Hyejoo Lee, Dongwoo Kim and Geunyoung Yeom
Link:
https://www.mdpi.com/1996-1944/15/4/1300
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