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Journal: Materials, 2022
Volume: 15
Number: 6313
6313
Article: Investigation of the RF Sputtering Process and the Properties of Deposited Silicon Oxynitride Layers under Varying Reactive Gas Conditions
Authors: by Nikolett Hegedüs, Csaba Balázsi, Tamás Kolonits, Dániel Olasz, György Sáfrán, Miklós Serényi and Katalin Balázsi
Link: https://www.mdpi.com/1996-1944/15/18/6313

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