Yoon, H.-W.; Shin, S.-M.; Kwon, S.-Y.; Cho, H.-M.; Kim, S.-G.; Hong, M.-P.
One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma. Materials 2021, 14, 2025.
https://doi.org/10.3390/ma14082025
AMA Style
Yoon H-W, Shin S-M, Kwon S-Y, Cho H-M, Kim S-G, Hong M-P.
One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma. Materials. 2021; 14(8):2025.
https://doi.org/10.3390/ma14082025
Chicago/Turabian Style
Yoon, Ho-Won, Seung-Min Shin, Seong-Yong Kwon, Hyun-Min Cho, Sang-Gab Kim, and Mun-Pyo Hong.
2021. "One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma" Materials 14, no. 8: 2025.
https://doi.org/10.3390/ma14082025
APA Style
Yoon, H.-W., Shin, S.-M., Kwon, S.-Y., Cho, H.-M., Kim, S.-G., & Hong, M.-P.
(2021). One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma. Materials, 14(8), 2025.
https://doi.org/10.3390/ma14082025