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Journal: Materials, 2021
Volume: 14
Number: 1595
Article:
Dry Etching Performance and Gas-Phase Parameters of C6F12O + Ar Plasma in Comparison with CF4 + Ar
Authors:
by
Nomin Lim, Yeon Sik Choi, Alexander Efremov and Kwang-Ho Kwon
Link:
https://www.mdpi.com/1996-1944/14/7/1595
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