Next Article in Journal
Mechanical Properties and Toxicity Risks of Lead-Zinc Sulfide Tailing-Based Construction Materials
Next Article in Special Issue
Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma
Previous Article in Journal
Transient Confinement of the Quaternary Tetramethylammonium Tetrafluoroborate Salt in Nylon 6,6 Fibres: Structural Developments for High Performance Properties
Previous Article in Special Issue
One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma
 
 

Order Article Reprints

Journal: Materials, 2021
Volume: 14
Number: 2941

Article: Ion-Enhanced Etching Characteristics of sp2-Rich Hydrogenated Amorphous Carbons in CF4 Plasmas and O2 Plasmas
Authors: by Jie Li, Yongjae Kim, Seunghun Han and Heeyeop Chae
Link: https://www.mdpi.com/1996-1944/14/11/2941

MDPI offers high quality article reprints with convenient shipping to destinations worldwide. Each reprint features a 270 gsm bright white cover and 105 gsm premium white paper, bound with two stitches for durability and printed in full color. The cover design is customized to your article and designed to be complimentary to the journal.

Order Cost and Details

Shipping Address

Billing Address

Notes or Comments

Validate and Place Order

The order must be prepaid after it is placed

req denotes required fields.
Back to TopTop