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Journal: Materials, 2021
Volume: 14
Number: 2941
Article:
Ion-Enhanced Etching Characteristics of sp2-Rich Hydrogenated Amorphous Carbons in CF4 Plasmas and O2 Plasmas
Authors:
by
Jie Li, Yongjae Kim, Seunghun Han and Heeyeop Chae
Link:
https://www.mdpi.com/1996-1944/14/11/2941
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