Seifert, M.; Lattner, E.; Menzel, S.B.; Oswald, S.; Gemming, T.
Phase Formation and High-Temperature Stability of Very Thin Co-Sputtered Ti-Al and Multilayered Ti/Al Films on Thermally Oxidized Si Substrates. Materials 2020, 13, 2039.
https://doi.org/10.3390/ma13092039
AMA Style
Seifert M, Lattner E, Menzel SB, Oswald S, Gemming T.
Phase Formation and High-Temperature Stability of Very Thin Co-Sputtered Ti-Al and Multilayered Ti/Al Films on Thermally Oxidized Si Substrates. Materials. 2020; 13(9):2039.
https://doi.org/10.3390/ma13092039
Chicago/Turabian Style
Seifert, Marietta, Eric Lattner, Siegfried B. Menzel, Steffen Oswald, and Thomas Gemming.
2020. "Phase Formation and High-Temperature Stability of Very Thin Co-Sputtered Ti-Al and Multilayered Ti/Al Films on Thermally Oxidized Si Substrates" Materials 13, no. 9: 2039.
https://doi.org/10.3390/ma13092039
APA Style
Seifert, M., Lattner, E., Menzel, S. B., Oswald, S., & Gemming, T.
(2020). Phase Formation and High-Temperature Stability of Very Thin Co-Sputtered Ti-Al and Multilayered Ti/Al Films on Thermally Oxidized Si Substrates. Materials, 13(9), 2039.
https://doi.org/10.3390/ma13092039