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Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160
 
 

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Journal: Materials, 2020
Volume: 13
Number: 5133

Article: Parametric Analysis and Stiffness Investigation of Extended End-Plate Connection
Authors: by Liang Luo, Maohua Du, Jian Yuan, Jun Shi, Suhui Yu and Yi Zhang
Link: https://www.mdpi.com/1996-1944/13/22/5133

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