Order Article Reprints

Zhang C, Gunes O, Li Y, Cui X, Mohammadtaheri M, Wen S-J, Wong R, Yang Q, Kasap S. Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO₂ Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160. Materials. 2020; 13(22):5132. https://doi.org/10.3390/ma13225132

Zhang, Chunzi, Ozan Gunes, Yuanshi Li, Xiaoyu Cui, Masoud Mohammadtaheri, Shi-Jie Wen, Rick Wong, Qiaoqin Yang, and Safa Kasap. 2020. "Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO₂ Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160" Materials 13, no. 22: 5132. https://doi.org/10.3390/ma13225132

Zhang, C., Gunes, O., Li, Y., Cui, X., Mohammadtaheri, M., Wen, S.-J., Wong, R., Yang, Q., & Kasap, S. (2020). Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO₂ Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160. Materials, 13(22), 5132. https://doi.org/10.3390/ma13225132