MDPI and ACS Style
Zhang, C.; Gunes, O.; Li, Y.; Cui, X.; Mohammadtaheri, M.; Wen, S.-J.; Wong, R.; Yang, Q.; Kasap, S.
Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160. Materials 2020, 13, 5132.
https://doi.org/10.3390/ma13225132
AMA Style
Zhang C, Gunes O, Li Y, Cui X, Mohammadtaheri M, Wen S-J, Wong R, Yang Q, Kasap S.
Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160. Materials. 2020; 13(22):5132.
https://doi.org/10.3390/ma13225132
Chicago/Turabian Style
Zhang, Chunzi, Ozan Gunes, Yuanshi Li, Xiaoyu Cui, Masoud Mohammadtaheri, Shi-Jie Wen, Rick Wong, Qiaoqin Yang, and Safa Kasap.
2020. "Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160" Materials 13, no. 22: 5132.
https://doi.org/10.3390/ma13225132
