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Open AccessArticle

Lithography-Free Route to Hierarchical Structuring of High-χ Block Copolymers on a Gradient Patterned Surface

1
Department of Materials Engineering, Keimyung University, Daegu 42601, Korea
2
School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Korea
3
Department of Materials Science and Engineering, Pukyong National University, Pusan 48513, Korea
4
Department of Advanced Materials Engineering, Keimyung University, Daegu 42601, Korea
*
Authors to whom correspondence should be addressed.
These authors contributed equally to this work.
Materials 2020, 13(2), 304; https://doi.org/10.3390/ma13020304
Received: 24 December 2019 / Revised: 5 January 2020 / Accepted: 8 January 2020 / Published: 9 January 2020
(This article belongs to the Special Issue Programmable Anisotropic Materials and Composites)
A chemically defined patterned surface was created via a combined process of controlled evaporative self-assembly of concentric polymer stripes and the selective surface modification of polymer brush. The former process involved physical adsorption of poly (methyl methacrylate) (PMMA) segments into silicon oxide surface, thus forming ultrathin PMMA stripes, whereas the latter process was based on the brush treatment of silicon native oxide surface using a hydroxyl-terminated polystyrene (PS-OH). The resulting alternating PMMA- and PS-rich stripes provided energetically favorable regions for self-assembly of high χ polystyrene-block-polydimethylsiloxane (PS-b-PDMS) in a simple and facile manner, dispensing the need for conventional lithography techniques. Subsequently, deep reactive ion etching and oxygen plasma treatment enabled the transition of the PDMS blocks into oxidized groove-shaped nanostructures. View Full-Text
Keywords: high χ di-block copolymer; wedge-on-Si geometry; controlled evaporative self-assembly; hierarchically ordered nanostructures; gradient patterned surface; oxide nanogroove high χ di-block copolymer; wedge-on-Si geometry; controlled evaporative self-assembly; hierarchically ordered nanostructures; gradient patterned surface; oxide nanogroove
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MDPI and ACS Style

Cho, H.R.; Choe, A.; Park, W.I.; Ko, H.; Byun, M. Lithography-Free Route to Hierarchical Structuring of High-χ Block Copolymers on a Gradient Patterned Surface. Materials 2020, 13, 304.

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