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Open AccessArticle

Fabrication of Nanopillar Crystalline ITO Thin Films with High Transmittance and IR Reflectance by RF Magnetron Sputtering

1
Guangxi Key Laboratory of Information Materials, Guilin University of Electronic Science and Technology, Guilin 541004, China
2
School of Materials Science and Engineering, Xihua University, Chengdu 610039, China
3
ARC Hub for Computational Particle Technology, Monash University, Clayton, Victoria 3800, Australia
*
Author to whom correspondence should be addressed.
Materials 2019, 12(6), 958; https://doi.org/10.3390/ma12060958
Received: 19 February 2019 / Revised: 17 March 2019 / Accepted: 18 March 2019 / Published: 22 March 2019
(This article belongs to the Special Issue Transparent Conductive Films and Their Applications)
Nanopillar crystalline indium tin oxide (ITO) thin films were deposited on soda-lime glass substrates by radio frequency (RF) magnetron sputtering under the power levels of 100 W, 150 W, 200 W and 250 W. The preparation process of thin films is divided into two steps, firstly, sputtering a very thin and granular crystalline film at the bottom, and then sputtering a nanopillar crystalline film above the bottom film. The structure, morphology, optical and electrical properties of the nanopillar crystalline ITO thin films were investigated. From X-ray diffraction (XRD) analysis, the nanopillar crystalline thin films shows (400) preferred orientation. Due to the effect of the bottom granular grains, the crystallinity of the nanopillar crystals on the upper layer was greatly improved. The nanopillar crystalline ITO thin films exhibited excellent electrical properties, enhanced visible light transmittance and a highly infrared reflectivity in the mid-infrared region. It is noted that the thin film deposited at 200 W showed the best combination of optical and electrical performance, with resistivity of 1.44 × 10−4 Ω cm, average transmittance of 88.49% (with a film thickness of 1031 nm) and IR reflectivity reaching 89.18%. View Full-Text
Keywords: indium tin oxide thin film; RF magnetron sputtering; nanopillar crystalline; transmittance; IR reflectance indium tin oxide thin film; RF magnetron sputtering; nanopillar crystalline; transmittance; IR reflectance
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MDPI and ACS Style

Dong, L.; Zhu, G.; Xu, H.; Jiang, X.; Zhang, X.; Zhao, Y.; Yan, D.; Yuan, L.; Yu, A. Fabrication of Nanopillar Crystalline ITO Thin Films with High Transmittance and IR Reflectance by RF Magnetron Sputtering. Materials 2019, 12, 958.

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